Chemical Exposure and Miscarriage
Topic Overview
Exposure to certain chemicals on a regular basis during pregnancy has
been linked to increased rates of
miscarriage.
Chemicals that may increase a woman's chance of
having a miscarriage include:
- Medicines. Before conceiving, or as soon as you
become aware that you are pregnant, talk to your doctor about all of the
medicines you have been taking. For example, the use of the medicine isotretinoin for the treatment
of acne during pregnancy has been shown to increase the risk of miscarriage and
to cause birth defects.1, 2
- Tetrachloroethylene (used in dry
cleaning).1
- Arsenic, lead, formaldehyde,
benzene, and ethylene oxide.3
- Alcohol
consumption, which can also cause birth defects and intellectual disabilities. There
is no known safe amount of alcohol intake during pregnancy. The safest course
is to avoid alcohol entirely while you are pregnant.
- Cocaine.
References
Citations
-
Speroff L, Fritz MA (2005). Recurrent early pregnancy
loss. In Clinical Gynecologic Endocrinology and Infertility, 7th ed., pp. 1069–1101. Philadelphia: Lippincott Williams
and Wilkins.
-
Briggs CG, et al. (2008). Isotretinoin. In
Drugs in Pregnancy and Lactation, 8th ed., pp. 987–991. Philadelphia: Lippincott
Williams and Wilkins.
-
Cunningham FG, et al. (2010). Abortion. In
Williams Obstetrics, 23rd ed., pp. 215–237. New York:
McGraw-Hill.
Credits
|
By
|
Healthwise Staff |
|
Primary Medical Reviewer
|
Sarah Marshall, MD - Family Medicine |
|
Specialist Medical Reviewer
|
Femi Olatunbosun, MB, FRCSC - Obstetrics and Gynecology |
|
Last Revised
|
April 18, 2011 |
Last Revised:
April 18, 2011
Speroff L, Fritz MA (2005). Recurrent early pregnancy
loss. In Clinical Gynecologic Endocrinology and Infertility, 7th ed., pp. 1069–1101. Philadelphia: Lippincott Williams
and Wilkins.
Briggs CG, et al. (2008). Isotretinoin. In
Drugs in Pregnancy and Lactation, 8th ed., pp. 987–991. Philadelphia: Lippincott
Williams and Wilkins.
Cunningham FG, et al. (2010). Abortion. In
Williams Obstetrics, 23rd ed., pp. 215–237. New York:
McGraw-Hill.
